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High efficiency improvements in AlGaN-based ultraviolet light-emitting diodes with specially designed AlGaN superlattice hole and electron blocking layers

机译:具有特殊设计的AlGaN超晶格空穴和电子阻挡层的AlGaN基紫外发光二极管的高效改进

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摘要

Al_χGa1_(-χ)N/A10.6Gao.4N graded superlattice hole blocking layers (GSL-HBLs) and AlχGa1_(-χ)N/ Al0.6Gao.4N graded superlattice electron blocking layers (GSL-EBLs) are applied to the traditional AlGaN-based ultraviolet light-emitting diodes (UVLEDs). This can obtain much higher internal quantum efficiency (IQE) and output power. In order to reveal the underlying physical mechanism of this unique structure, we have studied it numerically by APSYS simulation programs. We find that GSL-EBLs can obviously increase the electron potential height and reduce the hole potential height, produce less electron leakage and more hole injection, leading to higher carrier contration. GSL-HBLs can obviously reduce the hole leakage, reduce the thermal velocity and correspondingly the mean free path of the hot electrons, and increase the electron injection. This enhanced the electron capture efficiency of the multiple quantum wells, which can also help to reduce electron leakage.
机译:Al_χGa1_(-χ)N / A10.6Gao.4N梯度超晶格空穴阻挡层(GSL-HBLs)和AlχGa1_(-χ)N / Al0.6Gao.4N梯度超晶格电子阻挡层(GSL-EBLs)被应用于传统基于AlGaN的紫外发光二极管(UVLED)。这样可以获得更高的内部量子效率(IQE)和输出功率。为了揭示这种独特结构的潜在物理机制,我们通过APSYS仿真程序对其进行了数值研究。我们发现,GSL-EBLs可以明显提高电子势能高度,降低空穴势能高度,产生更少的电子泄漏和更多的空穴注入,从而导致更高的载流子矛盾。 GSL-HBLs可以明显减少空穴泄漏,降低热电子的热速度和相应的平均自由程,并增加电子注入。这提高了多个量子阱的电子捕获效率,这也可以帮助减少电子泄漏。

著录项

  • 来源
    《Superlattices and microstructures》 |2017年第4期|19-23|共5页
  • 作者单位

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Laboratory of Nanophotonic Functional Material and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AlGaN; UVLED; Graded superlattice hole blocking layers; Graded superlattice electron blocking layers; IQE;

    机译:AlGaN;UVLED;梯度超晶格空穴阻挡层;梯度超晶格电子阻挡层;智商;

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