机译:高磁场辅助退火对电沉积ZnO薄膜结构和光学,电学性能的影响
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China ,School of Materials Science and Engineering, Northeastern University, Shenyang, 110004, China;
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China;
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China;
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China;
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China;
Key Laboratory of Electromagnetic Processing of Materials, Northeastern University, Shenyang,110004, China;
ZnO films; High magnetic field; Annealing; Surface morphology;
机译:Al和Sb共掺杂对ZnO薄膜结构和光电性能的影响
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机译:快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
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