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Effect of Ag doping on the structural, electrical and optical properties of ZnO grown by MOCVD at different substrate temperatures

机译:Ag掺杂对MOCVD在不同衬底温度下生长的ZnO的结构,电学和光学性质的影响

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ZnO films and nanostructures were deposited on Si substrates by MOCVD using single source solid state zinc acetylacetonate (Zn(AA)) precursor. Doping by silver was realized in-situ via adding 1 and 10 wt. % of Ag acetylacetonate (Ag(AA)) to zinc precursor. Influence of Ag on the microstructure, electrical and optical properties of ZnO at temperature range 220-550 degrees C was studied by scanning, transmission electron and Kelvin probe force microscopy, photoluminescence and four-point probe electrical measurements. Ag doping affects the ZnO microstructure via changing the nucleation mode into heterogeneous and thus transforming the polycrystalline films into a matrix of highly c-axis textured hexagonally faceted nanorods. Increase of the work function value from 4.45 to 4.75 eV was observed with Ag content increase, which is attributed to Ag behaviour as a donor impurity. It was observed, that near-band edge emission of ZnO NS was enhanced with Ag doping as a result of quenching deep-level emission. Upon high doping of ZnO by Ag it tends to promote the formation of basal plane stacking faults defect, as it was observed by HR TEM and PL study in the case of 10 wt.% of Ag. Based on the results obtained, it is suggested that NS deposition at lower temperatures (220-300 degrees C) is more favorable for p-type doping of ZnO. (C) 2018 Elsevier Ltd. All rights reserved.
机译:使用单源固态乙酰丙酮锌(Zn(AA))前驱物通过MOCVD将ZnO薄膜和纳米结构沉积在Si衬底上。通过添加1和10wt。%原位实现银掺杂。乙酰丙酮化银(Ag(AA))对锌前体的百分比。通过扫描,透射电子和开尔文探针力显微镜,光致发光和四点探针电学测量研究了Ag对220-550℃温度范围内ZnO的微观结构,电学和光学性质的影响。 Ag掺杂通过将成核模式改变为异质而影响ZnO的微观结构,从而将多晶膜转变为具有高度c轴织构六边形多面纳米棒的基质。随着Ag含量的增加,功函数值从4.45增加到4.75 eV,这归因于Ag作为施主杂质的行为。观察到,通过淬灭深能级发射,Zn掺杂的ZnO NS的近带边缘发射得到增强。用HR TEM和PL研究发现,在10%(重量)的Ag的情况下,Ag对ZnO的高掺杂会促进基面堆叠缺陷缺陷的形成。基于获得的结果,表明在较低温度(220-300℃)下的NS沉积对于ZnO的p型掺杂更有利。 (C)2018 Elsevier Ltd.保留所有权利。

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