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Multiple-input NOR logic design using negative differential resistance circuits implemented by standard SiGe process

机译:使用通过标准SiGe工艺实现的负差分电阻电路的多输入NOR逻辑设计

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摘要

A multiple-input NOR logic gate using the negative differential resistance (NDR) circuit is demonstrated. The NDR circuit is composed of four resistors (R) and two SiGe-based heterojunction bipolar transistor (HBT), and it can show the NDR characteristics in the combined current-voltage curve by suitably designing the resistance. Compared to the resonant tunneling diode, the R-HBT-NDR circuit is much easier to be applied to some circuits which are combined with other Si-based or SiGe-based devices and circuits on the same chip. The fabrication is based on the standard 0.35 um SiGe BiCMOS process.
机译:演示了使用负差分电阻(NDR)电路的多输入NOR逻辑门。 NDR电路由四个电阻(R)和两个基于SiGe的异质结双极晶体管(HBT)组成,并且可以通过适当设计电阻来在组合的电流-电压曲线中显示NDR特性。与谐振隧穿二极管相比,R-HBT-NDR电路更容易应用于某些与其他基于Si或基于SiGe的器件和同一芯片上的电路组合的电路。该制造基于标准的0.35 um SiGe BiCMOS工艺。

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