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CMOS Sensor Nodes With Sub-Picowatt TFET Memory

机译:具有亚皮秒TFET存储器的CMOS传感器节点

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This paper describes the applicability of tunnel FETs (TFET) to ultra-low-power sensor-node embedded static random-access memories (SRAMs). Numerical TCAD device simulations were used first to characterize and optimize the performance of the TFET. The optimized TFETs show a steeper subthreshold slope than CMOS leading to a five orders of magnitude reduction in standby current. A lookup table model for circuit simulation of the TFET was developed based on characteristics obtained from TCAD simulations. A TFET SRAM cell is proposed and its performance is analyzed. Our novel 8T TFET SRAM cell operates at VDD = 1 V or lower. The read and write static noise margins are evaluated at 120 and 200 mV, with the operation speeds of 3.8 GHz and 800 MHz at VDD = 1 V in read and write, respectively. The cell leakage is less than 5 fA at VDD = 1 V. A sensor node architecture for implementation in a hybrid CMOS/TFET process with a large memory is proposed where the memory consumes as little as 4 fW/cell or 4.1 pW for a 1-kb array at 1 V supply voltage.
机译:本文介绍了隧道FET(TFET)在超低功耗传感器节点嵌入式静态随机存取存储器(SRAM)中的适用性。首先使用数字TCAD器件仿真来表征和优化TFET的性能。经过优化的TFET的亚阈值斜率比CMOS陡峭,从而使待机电流降低了五个数量级。基于从TCAD仿真获得的特性,开发了用于TFET电路仿真的查找表模型。提出了一种TFET SRAM单元,并对其性能进行了分析。我们新颖的8T TFET SRAM单元在VDD = 1 V或更低的电压下工作。读写静态噪声容限在120和200 mV时进行评估,在VDD = 1 V时读写时的工作速度分别为3.8 GHz和800 MHz。在VDD = 1 V时,单元泄漏小于5 fA。提出了一种用于具有大存储器的CMOS / TFET混合工艺中实现的传感器节点架构,其中存储器消耗低至4 fW /单元或4.1 pW。电源电压为1 V时的-kb阵列。

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