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Control of density, size and size uniformity of MBE-Grown InAs quantum dots by means of substrate misorientation

机译:通过衬底取向错误控制MBE生长的InAs量子点的密度,尺寸和尺寸均匀性

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摘要

the influence of (001) GaAs substrate misorientation in the [001] direction on the parameters of InAs quantum dot (QD0 ensembles has been studied by means of atomic force microscopy. It is shown that terrace patterning on vicinal surfaces permits control over the density, size and size uniformity of InAs QDs during their growth in the Stranski-Krastanow mode. By using The Monte Carlo approach for simulating the surface annealing, it was Shown that surface misorientation exhibits a stable tendency towards Elf-organization of undulate structure.
机译:通过原子力显微镜研究了[001] GaAs衬底在[001]方向上的取向错误对InAs量子点(QD0集成体)参数的影响。研究表明,在相邻表面上形成梯形图案可以控制密度, InAs量子点在Stranski-Krastanow模式下生长过程中的尺寸和尺寸均匀性,通过蒙特卡罗方法模拟表面退火,表明表面取向错误呈现出稳定的向着波纹结构的精灵组织的趋势。

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