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Hot electron energy relaxation in AlGaN/GaN heterostructures

机译:AlGaN / GaN异质结构中的热电子能弛豫

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We report measurements of the rate of energy loss per electron, P_e, by a two-dimensional electron gas in a series of AlGaN/GaN heterostructures grown on different substrates by MBE. The measurements cover a range of electron temperatures, T_e, from 4-40 K. A combination of zero and high magnetic field electrical transport measurements was used to determine T_e as a function of the power dissipated in the device. It was found that for the samples grown on the better lattice matched substrates P_e ∝ T_e~n, with n = 5 at the lowest temperatures, T_e 10 K. At higher temperatures, T_e > 10 K, n → 1 in all samples. The experimental results are compared with numerical calculations of the energy relaxation rate. We find that the emission of piezoelectrically coupled acoustic phonons is the dominant energy loss process in the studied temperature range.
机译:我们报告了通过MBE在不同衬底上生长的一系列AlGaN / GaN异质结构中的二维电子气对每个电子的能量损失率P_e的测量。这些测量涵盖了4-40 K的电子温度T_e范围。零磁场和高磁场电传输测量的组合用于确定T_e作为器件中功耗的函数。发现对于生长在晶格匹配度更好的衬底上的样品P_e ∝ T_e〜n,在最低温度下n = 5,T_e 10K。在较高温度下,T_e> 10 K,n→1 。将实验结果与能量弛豫率的数值计算进行了比较。我们发现,在所研究的温度范围内,压电耦合声子的发射是主要的能量损失过程。

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