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A high-power solid-state p~+-n-n~+ diode for picosecond-range closing switching

机译:用于皮秒范围闭合开关的大功率固态p〜+ -n-n〜+二极管

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The solid-state delayed breakdown diode (DBD) is investigated in this paper. Special attention is given to the internal dynamics and physical nature that underlie the delayed breakdown process. We investigate the source of initial carriers which trigger the front, explain the origin of the time delay in triggering the front, and detail the mechanism of front propagation. Then, a Si-based DBD with an improved three-step gradually changing doping structure is reviewed in this paper. The output voltage of an identical-sized improved DBD has been shown to increase from 2.12 kV to 2.25 kV and the dV/At peak of the output voltage has been increased from 30 kV ns~(-1) to 43.87 kV ns~(-1) with the same driving voltage through two-dimensional device simulations. Finally, a Si/SiGe heterojunction DBD with high-speed capability for picosecond switching is presented. Switch speed of the identical-sized Si/SiGe DBD (144.9 kV ns~(-1)) appears to be more than four times higher than that of the conventional Si device (30 kV ns~(-1)).
机译:本文研究了固态延迟击穿二极管(DBD)。要特别注意延迟击穿过程的内部动力学和物理性质。我们调查了触发前沿的初始载波的来源,解释了触发前沿的时间延迟的起因,并详述了前沿传播的机制。然后,本文对具有改进的三步逐步改变掺杂结构的Si基DBD进行了综述。已显示相同尺寸的改进DBD的输出电压从2.12 kV增加到2.25 kV,输出电压的dV / At峰值从30 kV ns〜(-1)增加到43.87 kV ns〜(- 1)通过二维器件仿真以相同的驱动电压。最后,提出了具有皮秒切换能力的高速Si / SiGe异质结DBD。尺寸相同的Si / SiGe DBD(144.9 kV ns〜(-1))的开关速度似乎是传统Si器件(30 kV ns〜(-1))的开关速度的四倍以上。

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