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Role Of Oxygen Vacancies In The High-temperature Thermopower Of Indium Oxide And Indium Tin Oxide Films

机译:氧空位在氧化铟和氧化铟锡薄膜的高温热电中的作用

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摘要

Thermopower measurements in a range of 300-650 K along with room temperature optical absorption and electrical resistivity studies were performed on indium oxide (IO) and indium tin oxide (ITO) thin films grown by reactive dc sputtering. The thermopower of as-grown and oxygen-annealed IO and ITO films measured in Ar ambient displayed characteristics attributable to oxygen loss. The observations were substantiated with optical absorption and electrical resistivity results.
机译:在300-650 K范围内的热功率测量以及室温光吸收和电阻率研究是对通过反应式直流溅射法生长的氧化铟(IO)和氧化铟锡(ITO)薄膜进行的。在氩气环境下测得的成膜氧退火IO和ITO膜的热功率显示出可归因于氧损失的特性。观察结果得到光吸收和电阻率结果的证实。

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