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The effect of different oxygen exchange layers on TaO_x based RRAM devices

机译:不同氧交换层对基于TaO_x的RRAM器件的影响

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In this work, we investigated the effect of the oxygen exchange layer (OEL) on the resistive switching properties of TaOx based memory cells. It was found that the forming voltage, SET-RESET voltage, R-off, R-on and retention properties are strongly correlated with the oxygen scavenging ability of the OEL, and the resulting oxygen vacancy formation ability of this layer. Higher forming voltage was observed for OELs having lower electronegativity/lower Gibbs free energy for oxide formation, and devices fabricated with these OELs exhibited an increased memory window, when using similar SET-RESET voltage range.
机译:在这项工作中,我们研究了氧交换层(OEL)对基于TaOx的存储单元的电阻转换特性的影响。已经发现,形成电压,SET-RESET电压,R-off,R-on和保持特性与OEL的除氧能力以及该层的氧空位形成能力密切相关。对于具有较低电负性/较低吉布斯自由能的氧化物形成的OEL,观察到较高的形成电压,并且当使用相似的SET-RESET电压范围时,用这些OEL制造的器件显示出增大的存储窗口。

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