Fabrication of Silicon Microlens Arrays Using Ion Beam Milling

摘要

A spherical mask for the fabrication of mierolens arrays was prepared by melting photoresist, and the spherical photoresist shape was transferred into a silicon substrate using ion beam milling. The ion beam milling process was computer simulated using the Sig-mund ion beam sputtering theory of collision cascades. The experiment results show that mierolens arrays can be effectively formed at low substrate temperature of less than 200℃. Shapes and dimensions of photoresist masks and silicon mierolens arrays were examined by the scanning electron microscope and tested by the surface stylus measurement.