Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor

摘要

We report the fabrication of transparent field-effect transistors using a single-crystalline thin-film transparent oxide semiconductor, InGaO_3(ZnO)_5, as an electron channel and amorphous hafnium oxide as a gate insulator. The device exhibits an on-to-off current ratio of ～10~6 and a field-effect mobility of ～80 square centimeters per volt per second at room temperature, with operation insensitive to visible light irradiation. The result provides a step toward the realization of transparent electronics for next-generation optoelectronics.