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New Cleaning Technologies

机译:新清洁技术

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In the field of precision cleaning - which is essential for the production of semiconductors and precision electronic devices - a variety of new technologies are being developed to ensure higher precision and efficiency without using fluorocarbons or other harmful substances.rnTo achieve the reduction target for greenhouse gases and ozone-depleting substances, it is necessary to develop new cleaning technologies that do not affect the environment, especially in the field of high-precision processing technology for semiconductors, etc.rnIn semiconductor production processes, contaminants are eliminated before and after wafer processing. Such cleaning processes take the most important parts of semiconductor production, because the quality of semiconductors is seriously affected by contaminants such as particles, inorganic substances like metals, and organic substances like polymer compounds. Due to the higher integration of semiconductors, there has been growing demand for technologies that permit the high-precision cleaning of larger surfaces.
机译:在半导体和精密电子设备生产中必不可少的精密清洁领域,正在开发各种新技术,以确保更高的精度和效率,而无需使用碳氟化合物或其他有害物质。rn实现温室气体减排目标和消耗臭氧层的物质,有必要开发一种不影响环境的新清洁技术,尤其是在半导体等高精度加工技术领域。在半导体生产过程中,在晶片加工前后都应消除污染物。这种清洗工艺是半导体生产中最重要的部分,因为半导体的质量会受到污染物(例如颗粒,无机物质(例如金属)和有机物质(例如高分子化合物))的严重影响。由于半导体的更高集成度,对允许高精度清洁较大表面的技术的需求不断增长。

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  • 来源
    《Science & Technology in Japan》 |2008年第101期|25|共1页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 01:31:29

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