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Relationship between the orientation of texture and heteroepitaxy of diamond and related materials films on silicon single crystal and the valence electron structure of the interface

机译:单晶硅上金刚石及相关材料膜的织构取向和异质外延与界面价电子结构的关系

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Diamond and cubic boron nitride films have already been applied practically because of their excellent properties. The specific orientations of the films have special meaning on their application in optics and microelectronics fields. In this paper, the relative electron density differences of the interface between the different crystal planes of silicon substrate and those of diamond and cubic boron films are calculated with the empirical electron theory in solids and molecules. Analyses on the calculation results show that in the range of the researched films, the smaller the relative electron density difference between the film and the substrate is, the stabler the film is in thermodynamics. Therefore, the electron density difference is the essential factor of determining the orientation of the texture and heteroepitaxy of the films. The deductions accord well with the experimental facts. The calculation methods and the theory not only provide a new angle of view for the research of the growth mechanism of diamond film and cubic boron nitride film on the silicon substrate, but also provide a possible direction for the prediction of the orientation of other films.
机译:金刚石和立方氮化硼膜由于其优异的性能而已在实践中应用。薄膜的特定取向对它们在光学和微电子领域的应用具有特殊意义。本文利用经验电子理论,计算了固体和分子中硅衬底不同晶面与金刚石和立方硼薄膜晶面之间的相对电子密度差。对计算结果的分析表明,在所研究的薄膜范围内,薄膜与基底之间的相对电子密度差越小,薄膜的热力学越稳定。因此,电子密度差是确定膜的纹理取向和异质外延性的必要因素。推论与实验事实非常吻合。计算方法和理论不仅为研究金刚石膜和立方氮化硼膜在硅衬底上的生长机理提供了新的视角,而且为预测其他膜的取向提供了可能的方向。

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