Measurement technique for the incident electron current in secondary electron detectors and its application in scanning electron microscopes

著录项

• 来源
  《Scanning》 |2001年第6期|403-409|共7页
• 作者

  Toshihide Agemura; Satoru Fukuhara; Hideo Todokoro;

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• 作者单位

  Beam Technology Center Hitachi High-Technologies Corporation Ibaraki Japan;

  Beam Technology Center Hitachi High-Technologies Corporation Ibaraki Japan;

  Beam Technology Center Hitachi High-Technologies Corporation Ibaraki Japan;

  展开▼
• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《化学文摘》(CA);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  scanning electron microscope; Everhart-Thornley detector; signal-to-noise ratio; geometric collection efficiency; secondary electron yield;

  机译：扫描电子显微镜;Everhart-Thornley检测器;信噪比;几何收集效率;二次电子产率;