THERMOIONIC VACUUM ARC - A WAY FOR HIGH TECH THIN FILM DEPOSITION

摘要

A new equipment for the technology of thin film deposition using thermoionic vacuum arc is presented. Advantages of this system are underlined extended applications possibilities of this new technology for increase of the microhardness of the pieces, decrease of the friction of moving pieces, change of the chemical reactivity of the pieces (corrosion resistant components) an also will be used for the development of nanostructures materials, are given.