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A high resolution scanning electron microscope for in situ investigation of swift heavy ion induced modification of solid surfaces

机译:高分辨率扫描电子显微镜,用于原位研究快速重离子诱导的固体表面改性

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A new in situ high resolution electron microscope (HRSEM) setup has been designed and integrated into the materials science beamline (M-branch) of the universal linear accelerator at Gesellschaft für Schwerionenforschung, Darmstadt for in situ investigations of swift heavy ion induced surface modifications. Special ports for in situ experiments are installed at the HRSEM chamber to connect it to the high vacuum beamline, which is equipped with suitable beam control and shaping devices. In order to demonstrate the feasibility and power of this new instrument, first experiments were performed on a 50-nm-thick Fe2O3 film on Si substrate, which exhibited submicrometer size holes due to irradiation induced dewetting in a previous experiment. We have demonstrated that with our new instrument, the development of individual dewetting holes as a function of the ion fluence can be investigated and even the interaction between them can be studied. To illustrate pattern formation during grazing incidence, 3.6 MeV/u 131Xe ion irradiation was carried out on a 25-nm-thick NiO film on SiO2/Si at a tilt angle of 75°. The SEM image sequence recorded during the experiment reveals the development of a lamellaelike structure also seen before in ex situ experiments. With our new in situ setup, however, we are able to not only investigate the overall average pattern formation, but also to track the formation and decay of individual linking structures, which would be hardly possible in a standard ex situ experiment. © 2010 American Institute of Physics Article Outline INTRODUCTION EXPERIMENTAL SETUP General overview The HRSEM The ion beam line The ion beam/HRSEM interface PRELIMINARY RESULTS Normal ion beam incidence Grazing ion beam incidence CONCLUSION
机译:在达姆施塔特GesellschaftfürSchwerionenforschung的通用线性加速器的材料科学束线(M-branch)中,已经设计了一种新的原位高分辨率电子显微镜(HRSEM)装置,用于快速重离子诱导的表面改性的原位研究。 HRSEM室安装了用于原位实验的特殊端口,以将其连接到高真空束线,该束线配有合适的束控制和整形装置。为了证明这种新仪器的可行性和功能,首先在Si衬底上的50nm厚的Fe2 O3 膜上进行了首次实验,该膜由于辐照引起的去湿而显示出亚微米级的孔。之前的实验。我们已经证明,使用我们的新仪器,可以研究各个去湿孔与离子通量的关系,甚至可以研究它们之间的相互作用。为了说明掠入射期间的图案形成,在SiO2 / Si上25纳米厚的NiO膜上以75°的倾斜角进行了3.6 MeV / u 131 Xe离子辐照。在实验过程中记录的SEM图像序列揭示了层状结构的发展,这在异位实验中也可以看到。但是,使用我们的新原位设置,我们不仅能够研究整体平均图案的形成,而且能够跟踪单个连接结构的形成和衰减,而这在标准的非原生境实验中几乎是不可能的。 ©2010美国物理研究所文章大纲简介实验设置概述HRSEM离子束线离子束/ HRSEM界面基本结果正常离子束入射放牧离子束入射结论

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