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Broad-beam high-current dc ion source based on a two-stage glow discharge plasma a

机译:基于两级辉光放电等离子体 a 的宽束大电流直流离子源

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We have designed, made, and demonstrated a broad-beam, dc, ion source based on a two-stage, hollow-cathode, and glow discharges plasma. The first-stage discharge (auxiliary discharge) produces electrons that are injected into the cathode cavity of a second-stage discharge (main discharge). The electron injection causes a decrease in the required operating pressure of the main discharge down to 0.05 mTorr and a decrease in required operating voltage down to about 50 V. The decrease in operating voltage of the main discharge leads to a decrease in the fraction of impurity ions in the ion beam extracted from the main gas discharge plasma to less than 0.2 %. Another feature of the source is a single-grid accelerating system in which the ion accelerating voltage is applied between the plasma itself and the grid electrode. The source has produced steady-state Ar, O, and N ion beams of about 14 cm diameter and current of more than 2 A at an accelerating voltage of up to 2 kV. © 2010 American Institute of Physics Article Outline INTRODUCTION TWO-STAGE DISCHARGE SYSTEM OF THE ION SOURCE DESIGN AND PARAMETERS OF THE ION SOURCE CONCLUSION
机译:我们已经设计,制造和演示了基于两级空心阴极的宽束直流离子源,并且辉光放电等离子体。第一级放电(辅助放电)产生电子,这些电子被注入第二级放电(主放电)的阴极腔中。电子注入导致主放电的所需工作压力降低至0.05 mTorr,并降低至约50 V的所需工作电压。主放电操作电压的降低导致杂质分数的降低从主气体放电等离子体提取的离子束中的离子小于0.2%。源的另一个特征是单栅极加速系统,其中在等离子体本身和栅极之间施加离子加速电压。该源在高达2 kV的加速电压下产生了直径约为14 cm的稳态Ar,O和N离子束,电流超过2A。 ©2010美国物理研究所文章概述离子源的两阶段放电系统设计和离子源的参数结论

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