首页> 外文期刊>Research Disclosure >INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
【24h】

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

机译:过满双向标记上的强度不平衡校准

获取原文
获取原文并翻译 | 示例
           

摘要

The present disclosure describes various aspects of systems, apparatuses, and methods for correcting the detected positions of alignment targets disposed on a substrale, particularly when a spot size of the light used to detect the alignment targets at least partially overfills each of the alignment targets, such as is the case when the alignment targets include a combined bidirectional (CB) alignment mark. The present disclosure further describes various aspects of systems, apparatuses, and methods for aligning the substrate using the corrected data to ensure accurate exposure of one or more patterns on the substrate. In some aspects, the present disclosure describes a metrology system. The metrology system can include an illumination system configured to generate and direct light to be diffracted from first and second alignment targets. The second alignment target can be oriented differently than the first alignment target. The metrology system can further include a detection system configured to receive first and second diffracted light beams diffracted from respective ones of the first and second alignment targets and to generate a measurement signal therefrom. The measurement signal can include a combined intensity signal including combined intensity values corresponding to the first and second diffracted light beams diffracted from the first and second alignment targets, respectively. The metrology system can further include a controller configured to fit the combined intensity signal using a set of templates to determine a set of weight values. The controller can be further configured to determine, based on the set of templates and the set of weight values, first and second intensity sub-signals including first and second intensity values corresponding to the first and second diffracted light beams. The controller can be further configured to determine first and second intensity imbalance signals based on the first and second intensity sub-signals. The controller can be further configured to determine a set of corrections (e.g., two corrections (X and Y) per color per polarization) to the measurement signal based on the first and second intensity imbalance signals.
机译:本公开描述了用于校正设置在底板上的检测到的对准目标的检测到位置的系统,装置和方法的各个方面,特别是当用于检测对准目标的光的光斑尺寸至少部分地溢出每个对准目标时,例如,当对准目标包括组合的双向(CB)对准标记时是这种情况。本公开还介绍了用于使用校正数据对准基板的系统,装置和方法的各个方面,以确保在基板上精确地曝光一个或多个图案。在一些方面,本公开描述了计量系统。计量系统可以包括被配置为产生和直接光从第一和第二对准靶衍射的照明系统。第二对准目标可以与第一对准目标不同的定向。计量系统还可包括检测系统,该检测系统被配置为接收从第一和第二对准目标的各个方向衍射的第一和第二衍射光束,并从中产生测量信号。测量信号可以包括组合强度信号,包括分别与第一和第二对准靶衍射的第一和第二衍射光束对应的组合强度值。计量系统还可以包括控制器,该控制器被配置为使用一组模板拟合组合强度信号以确定一组权重值。控制器还可以被配置为基于该组模板和重量值集,第一和第二强度子信号,包括与第一和第二衍射光束对应的第一和第二强度值。控制器还可以被配置为基于第一和第二强度子信号确定第一和第二强度不平衡信号。控制器还可以被配置为基于第一和第二强度不平衡信号确定一组校正(例如,每个偏振的两个校正(x和y))到测量信号。

著录项

  • 来源
    《Research Disclosure》 |2021年第688期|2130-2131|共2页
  • 作者

  • 作者单位
  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号