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METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATED METHOD

机译:基于高谐波生成和相关方法的计量装置

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In a first aspect of the invention, there is provided a metrology apparatus for measurement of a target formed on a substrate by a lithographic process, the metrology apparatus comprising: a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target; wherein said configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation. In a second aspect of the invention, there is provided a configured solid high harmonic generation medium comprising an axicon shape operable to impart an annular profile onto first radiation received at an input surface; and concentric circular grooves on an output surface such that high harmonic second radiation generated at said output surface resulting from excitation by said first radiation is focused on and/or propagates along an optical axis of the configured solid high harmonic generation medium. In a third aspect of the invention there is provided, a metrology method for measuring a target formed on a substrate by a lithographic process comprising: exciting a configured solid high harmonic generation medium with first radiation, to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium and to shape the beam of said second radiation and/or separate said first radiation and said second radiation; and detecting said second radiation, at least a portion of which having been scattered by said target. In a fourth aspect of the invention, there is provided a configured solid high harmonic generation medium comprising an input surface operable to receive a first radiation; and an output surface operable to emit a high harmonic second radiation resulting from excitation by the first radiation.
机译:在本发明的第一方面,提供了一种测量装置,用于通过光刻工艺测量形成在基板上的目标,该计量装置包括:可操作以提供第一辐射的辐射源;构造成通过所述第一辐射接收和激发的配置的固体高谐波产生介质以产生来自配置的固体高谐波产生介质的输出表面的高谐波第二辐射;和检测装置可操作以检测所述第二辐射,其中至少一部分由所述靶散射;其中所述配置的固体高谐波产生介质被配置为将所述第二辐射的光束和/或分开所述第一和第二辐射形状。在本发明的第二方面,提供了一种配置的固体高谐波产生介质,其包括悬臂形状,其可操作以赋予环形轮廓在输入表面上接收的第一辐射上;在输出表面上的同心圆形凹槽,使得由所述第一辐射的激发产生的所述输出表面处产生的高谐波第二辐射聚焦和/或沿着配置的固体高谐波产生介质的光轴传播。在本发明的第三方面,提供了一种测量通过光刻工艺测量在基板上形成的目标的计量方法,包括:激励具有第一辐射的配置的固体高谐波产生介质,以产生来自输出表面的高谐波第二辐射在配置的固体高谐波产生介质中,并形成所述第二辐射的光束和/或分离所述第一辐射和所述第二辐射;并检测所述第二辐射,其中至少一部分被所述靶散射。在本发明的第四方面,提供了一种配置的固体高谐波产生介质,其包括可操作以接收第一辐射的输入表面;并且输出表面可操作以发射由第一辐射激发产生的高谐波第二辐射。

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    《Research Disclosure》 |2021年第685期|1865-1866|共2页
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