Research Disclosure

摘要

This research disclosure relates to a laser radiation source suitable for being used in a EUV radiation source for a lithographic tool. As it is known, a EUV radiation source may comprise a CO2- laser, is arranged to deposit energy via a laser beam into a fuel, such as tin (Sn) which is provided from, e.g., a fuel emitter. Although tin is referred to in the following description, any suitable fuel may be used. The fuel may, for example, be in liquid form, and may, for example, be a metal or alloy. One known type of EUV radiation source directs laser radiation onto fuel targets. This converts the fuel targets into EUV radiation emitting plasma. A radiation source of this type may be referred to as a laser-produced plasma (LPP) source. Known LPP sources have relatively low conversion efficiencies.