OBJECT TABLE, STAGE APPARATUS, HOLDING METHOD AND LITHOGRAPHIC APPARATUS

摘要

It is an object of the present invention to enable a clamping or holding of an object such as a substrate or patterning device in such manner that occurring deformations caused by the clamping or holding process arc mitigated. According to a further aspect of the present invention, there is provided a method of holding an object to a holding surface of an object table.