Research Disclosure

摘要

This research disclosure relates to a lithographic apparatus. In particular, it relates to a pellicle cleaning apparatus for use in a lithographic apparatus. The lithographic apparatus may be an extreme ultraviolet (EUV) lithographic apparatus. (Photo) lithography is a process of transferring a pattern to a radiation-sensitive substrate by exposing the substrate to radiation having the pattern. The pattern may be imparted onto a beam of radiation using a reticle. Radiation used in a lithographic apparatus may be extreme ultraviolet (EUV). EUV radiation has a wavelength in the range 4 - 20 nm, for example 13.5 nm. EUV lithography is used in printing integrated circuits.