Design-aware dose control, accounting the use of multiple features in the die

摘要

It is proposed to provide a method of determining a dose profile (slit and scan direction) to be applied by a lithographic apparatus to a patterning device based on actual reticle product features data. On an actual reticle OPC and writing errors arc made causing significant Critical Dimension (CD) / Best dose (BE) deviations compared to a nominal reticle (e.g. design reticle). It is proposed to select a representative set of product features, obtain dimensional data at reticle level and determine for each feature their optimal dose. When the optimal dose (BE) distribution is known for the particular reticle a better yielding dose profile can be derived to control the dose as applied by the lithographic apparatus.