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A new type of TiN coating combining broad band visible transparency and solar control

机译:新型TiN涂层,结合了宽带可见光透明性和日光控制

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Production of this fimls of Titanium nitride (TiN) wiht N/Ti ratios as high as 1.3 has been achieved without destroying the metallic properties characteristic of stoichiometric TiN. The resultant change in mobile electron density show that by depositing thin films the onset of a rise in reflection can be pushed out almost into the near infra red. It then becomes possible to produce films which transmit daylight neutrally at reasonably high levels, while still maintaining solar control in the NIR and a low emittance. Nitrogen ion assisted cathodic arc deposition has been used to achieve these results. Both the additioanl impacting and implanting nitrogne ions raise stoichiometry and help to reduce disorder so as to maintain good matallic character.
机译:在不破坏化学计量的TiN的金属特性的情况下,已经实现了N / Ti比高达1.3的这种氮化钛(TiN)薄膜的生产。移动电子密度的最终变化表明,通过沉积薄膜,反射上升的开始几乎可以被推到近红外区域。这样就可以生产出可以在相当高的水平下中性地透射日光的薄膜,同时仍保持NIR的阳光控制和低发射率。氮离子辅助阴极电弧沉积已用于获得这些结果。加成环的硝酸根离子的撞击和注入都提高了化学计量,并有助于减少疾病,从而保持良好的金属特性。

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