首页> 外文期刊>RARE METALS >Bulk single crystal growth of SiGe by PMCZ method
【24h】

Bulk single crystal growth of SiGe by PMCZ method

机译:PMCZ法生长SiGe单晶

获取原文
获取原文并翻译 | 示例
           

摘要

A new type of magnetic device was used to replace the conventional electro-magnetic field for CZSi (doped with Ge) growth. The device was composed of three permanent magnetic rings and called PMCZ device. The lines of magnetic force are horizontally distributed at radial 360℃. Using the ring permanent magnetic field, thermal convection in melt and centrifugal pumping flows due to crystal rotation could be strongly suppressed so that the fluctuations of temperature and micro-growth rate at solid/liquid interface could be restrained effectively. In the PMCZ condition, the growing environment of SiGe bulk single crystal was similar to the crystal growth in space under the condition of micro-gravity. The motion of impurities (Ge, oxygen, etc.) had been controlled by diffusion near the solid/liquid interface. Oxygen concentration became lower and the distribution of composition became more homogeneous along longitudinal direction and across a radial section in the grown SiGe crystal. The mechanism of PMCZ superior to MCZ was also discussed.
机译:一种新型的磁性器件被用来代替传统的CZSi(掺杂Ge)生长的电磁场。该设备由三个永磁环组成,称为PMCZ设备。磁力线在径向360℃水平分布。利用环形永久磁场,可以有效地抑制由于晶体旋转而引起的熔体和离心泵送流中的热对流,从而有效地抑制了固液界面温度和微增长率的波动。在PMCZ条件下,SiGe块状单晶的生长环境与微重力条件下的空间晶体生长相似。杂质(Ge,氧等)的运动已通过固/液界面附近的扩散来控制。在生长的SiGe晶体中,氧气浓度降低,组成的分布沿纵向和径向区域变得更均匀。还讨论了PMCZ优于MCZ的机理。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号