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IMPROVED UNDERSTANDING OF PHYSICAL DEFECT MECHANISMS USING FAULT SIMULATION

机译:使用故障模拟改善对物理缺陷机理的理解

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摘要

Failure mechanisms in highly integrated designs are becoming more subtle, making them difficult to locate and understand. Successful analysis requires the precise location of the anomaly in three dimensions, prior to physical analysis, when strip and inspect techniques do not yield a failure mechanism. This paper presents a technique whereby simulations of hypothesized defects, in combination with Ⅰ-Ⅴ curves obtained by electrical microprobing, aid in locating physical defects. Given the exact location, techniques requiring that the physical and chemical sample integrity be maintained, such as TEM and AES, can be employed to give insight into the failure mechanism.
机译:高度集成的设计中的故障机制变得越来越微妙,使其难以定位和理解。成功的分析需要在物理分析之前,当剥离和检查技术不能产生故障机制时,在三个维度上精确定位异常。本文提出了一种技术,可以通过模拟假想缺陷并结合通过电微探测获得的Ⅰ-Ⅴ曲线来定位物理缺陷。给定确切的位置,可以采用要求保持物理和化学样品完整性的技术(例如TEM和AES)来深入了解故障机理。

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