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Electroplating: Panel and Pattern Plating, Part 1

机译:电镀:面板和图案电镀,第1部分

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摘要

If one thought that electroless copper and other metallization systems were complex, and the deep dark secrets of these systems were shrouded in black magic, this month's discussions on electroplating will seem like brain surgery. In this next series of columns, the intricacies of electrodeposition technology and its function of building up the thickness of copper in the through holes and on the board surface will be pre- sented in detail. The function of the active ingredients in the electrolytic copper plating solutions will be presented. Process control limits for the various plating solution components and the effects on deposit integrity will be discussed.
机译:如果有人认为化学镀铜和其他金属化系统很复杂,而这些系统的深层黑暗秘密被黑魔法所笼罩,那么本月关于电镀的讨论似乎就像是脑外科手术。在接下来的系列专栏中,将详细介绍电沉积技术的复杂性及其在通孔中和板表面上积聚铜厚度的功能。将介绍活性成分在电解铜电镀液中的功能。将讨论各种电镀液成分的工艺控制极限及其对沉积完整性的影响。

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