PRODUCTION OF PROTOTYPE OF NEW LPCVD USING LAMP HEATING AND STUDY OF CHARACTERISTICS-PROPERTIES OF POLYSILICON FILM, DEPOSITED-

摘要

In the micromachining research field, there are great demands to great demands to reduce the startup and shut-down time of film deposition system, to reduce running costs, to produce thick film of poysilicon, and to enable the high-speed polysilicon film deposition. However, no such polysilicon film deposition system which fulfills the above-listed demands can currently be found. Therefore,in order to meet these demands, the authors designed new LPCVD which is characterized by spot-heating using a lamp and produced a prototype of this apparatus, and actually operated this apparatus to study its characteristics.