...
首页> 外文期刊>IEEE Transactions on Plasma Science >Explosion model applied to an intense pulsed plasma source for thin film deposition
【24h】

Explosion model applied to an intense pulsed plasma source for thin film deposition

机译:爆炸模型应用于强脉冲等离子体源进行薄膜沉积

获取原文
获取原文并翻译 | 示例
           

摘要

A pulsed plasma source for deposition of thin polymer films was modeled numerically with the one-dimensional (1-D) time dependent fluid transport equations describing an explosion for an ideal gas. Initial number density, explosion temperature, and velocity were made consistent with values in an experimental reactor. These quantities as well as pressure and fluence were modeled for a distance of 2 m and for a time duration of 93 /spl mu/s. The trajectory for maximum pressure calculated from the model was observed to be consistent with the experimentally measured trajectory of maximum emitted light from an acetylene plasma. Measured axial profiles of areal density for the deposited polymer films were compared with modeled fluence.
机译:使用一维(1-D)时间相关的流体传输方程对用于沉积聚合物薄膜的脉冲等离子体源进行了数值建模,该方程描述了理想气体的爆炸情况。使初始数密度,爆炸温度和速度与实验反应器中的值一致。这些量以及压力和注量是针对2 m的距离和93 / spl mu / s的持续时间建模的。观察到从模型计算出的最大压力的轨迹与从乙炔等离子体发射的最大光的实验测量轨迹一致。将沉积的聚合物膜的轴向密度的轴向测量轮廓与模拟注量进行比较。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号