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CCl4 Decomposition in RF Thermal Plasma in Inert and Oxidative Environments

机译:惰性和氧化环境中射频热等离子体中的CCl 4 分解

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The decomposition of carbon tetrachloride was investigated in an RF inductively coupled thermal plasma reactor in inert CCl4–Ar and in oxidative CCl4–O2–Ar systems, respectively. The exhaust gases were analyzed by gas chromatography-mass spectrometry. The kinetics of CCl4 decomposition at the experimental conditions was modeled in the temperature range of 300–7,000 K. The simulations predicted 67.0 and 97.9% net conversions of CCl4 for CCl4–Ar and for CCl4–O2–Ar, respectively. These values are close to the experimentally determined values of 60.6 and 92.5%. We concluded that in RF thermal plasma much less CCl4 reconstructed in oxidative environment than in an oxygen-free mixture.
机译:在惰性CCl 4 -Ar和氧化CCl 4 -O 2 的RF电感耦合热等离子体反应器中研究了四氯化碳的分解–Ar系统。通过气相色谱-质谱法分析废气。在300–7,000 K的温度范围内,模拟了实验条件下CCl 4 的动力学。模拟预测CCl 4 的净转化率为67.0和97.9% 4 –Ar和CCl 4 –O 2 –Ar分别为。这些值接近实验确定的60.6和92.5%的值。我们得出的结论是,在射频热等离子体中,氧化环境中重建的CCl 4 比无氧混合物中的少得多。

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