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Nitric Oxide Up-Regulates the Expression of Methionine Sulfoxide Reductase Genes in the Intertidal Macroalga Ulva fasciatan for High Light Acclimation

机译:一氧化氮上调潮汐Macroalga Ulva fasciatan中的蛋氨酸亚砜还原酶基因的表达,以适应高光照

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摘要

Nitric oxide (NO) has emerged as a fundamental signal molecule involved in the responses of plant to stress. A role for NO in the regulation of methionine sulfoxide reductase (MSR) mRNA expression and high light acclimation was studied in a green macroalga Ulva fasciata Delile. Transfer from darkness to high light (≥1,200 μmol photons m−2 s−1) inhibited photosynthesis and growth but increased NO production and UfMSRA and UfMSRB transcripts. Treatment with an NO scavenger, 2-(4-carboxy- phenyl)-4,4,5,5-tetramethyl-imidazoline-1-oxyl-3-oxide (cPTIO), at 1,200 μmol photons m−2 s−1 caused a further growth inhibition accompanied by an inhibition of the increase of UfMSRA and UfMSRB transcripts by high light, while treatment with an NO generator, sodium nitroprusside (SNP), alleviated the growth inhibition and enhanced UfMSRA and UfMSRB expression. Exposure to moderate light (300 μmol photons m−2 s−1) conditions also increased UfMSRA and UfMSRB transcripts, which were not affected by cPTIO treatment but were enhanced by SNP treatment. So, NO does not mediate the up-regulation of UfMSR genes by transfer to moderate light possibly as a precautionary mechanism in the sense of increasing light intensities in the daytime. In conclusion, NO production can be induced in U. fasciata upon exposure to high light for up-regulation of UfMSRA and UfMSRB expression but the level of NO production is not sufficient for acquisition of full tolerance to high light stress. Enhanced NO production by an exogenously applied NO generator can effectively trigger the high light acclimation process, including UfMSRA and UfMSRB expression.
机译:一氧化氮(NO)已成为一种基本信号分子,参与植物对胁迫的反应。在绿色大型藻类Ulva fasciata Delile中研究了NO在蛋氨酸亚砜还原酶(MSR)mRNA表达的调节和高光适应中的作用。从黑暗转移到高光(≥1200μmol光子m −2 s -1 )抑制了光合作用和生长,但增加了NO的产生以及UfMSRA和UfMSRB转录本。在1,200μmol光子m 下用NO清除剂2-(4-羧基-苯基)-4,4,5,5-四甲基咪唑啉-1-氧基-3-氧化物(cPTIO)处理/ sup> s −1 引起进一步的生长抑制,同时强光抑制了UfMSRA和UfMSRB转录物的增加,而用NO发生器硝普钠(SNP)处理可减轻生长抑制和增强UfMSRA和UfMSRB表达。暴露于中度光照(300μmol光子m −2 s -1 )条件下,UfMSRA和UfMSRB转录本也增加,不受cPTIO处理影响,但受SNP处理增强。因此,从白天增加光强度的意义上讲,NO不会通过转移到适度的光来介导UfMSR基因的上调,这可能是一种预防机制。总之,在暴露于高光下的UsMSRA和UfMSRB表达中,可以在筋膜藻中诱导NO产生,但是NO产生的水平不足以完全获得对高光胁迫的耐受性。通过外源应用NO发生器增强NO的产生可以有效触发高光适应过程,包括UfMSRA和UfMSRB表达。

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