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首页> 外文期刊>Physical Review. B, Condensed Matter >Femtosecond laser induced desorption of H_2, D_2, and HD from Ru(0001): Dynamical promotion and suppression studied with ab initio molecular dynamics with electronic friction
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Femtosecond laser induced desorption of H_2, D_2, and HD from Ru(0001): Dynamical promotion and suppression studied with ab initio molecular dynamics with electronic friction

机译:Femtosecond激光诱导Hu(0001)的H_2,D_2和HD的解吸:用电子摩擦与AB Initio分子动力学研究的动力促进和抑制

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摘要

We perform ab initio molecular dynamics simulations to study the femtosecond laser induced desorption ofH_2, D_2, and HD from a H:D-saturated Ru(0001) surface. To this aim we have extended the ab initio moleculardynamics with electronic friction (AIMDEF) scheme to include a random force that is a function of a timedependentelectronic temperature. The latter characterizes the action of the ultrashort laser pulse according to atwo temperature model. This allows us to perform multidimensional, hot-electron driven reaction dynamics andinvestigate the dependence of the desorption yields on the relative H:D isotope concentration on the surface. OurAIMDEF simulations show that the desorption process takes place in the presence of a heated adsorbate systemthat clearly influences the desorption dynamics. The heating of the adsorbate system is more (less) pronouncedthe larger is the concentration of the lighter (heavier) isotope. As a result, we conclude that the presence of H onthe surface favors the desorption of molecules, whereas the presence of D hampers it, in agreement with previousexperimental observations in which the phenomenon of “dynamical promotion” of a surface reaction had beenpostulated [Denzler et al., Phys. Rev. Lett. 91, 226102 (2003)].
机译:我们执行AB Initio分子动力学模拟,以研究Femtosecond激光诱导的解吸来自H:D饱和Ru(0001)表面的H_2,D_2和HD。对于这个目的,我们已经扩展了AB Initio分子具有电子摩擦(Aimdef)方案的动态包括随机力,即是定期依赖的函数电子温度。后者的表征根据超短激光脉冲的作用两个温度模型。这使我们能够执行多维,热电驱动的反应动力学和研究解吸产率对表面上的相对H:D同位素浓度的依赖性。我们的AIMDEF模拟表明解吸过程在加热吸附系统的存在下进行这清楚地影响了解吸动态。吸附系统的加热更多(较少)发音较大的是较轻(较重)同位素的浓度。结果,我们得出结论,H上的存在表面有利于分子的解吸,而D扰乱它的存在,同意实验观察,其中表面反应的“动态促进”现象假设[Denzler等人。,phy。 rev. lett。 91,226102(2003)]。

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  • 来源
    《Physical Review. B, Condensed Matter》 |2017年第12期|125439.1-125439.7|共7页
  • 作者单位

    Departamento de Fisica de Materiales Facultad de Quimicas (UPV/EHU) Apartado 1072 20080 Donostia-San Sebastian Spain Centro de Fisica de Materiales CFM/MPC (CSIC-UPV/EHU) Paseo Manuel de Lardizabal 5 20018 Donostia-San Sebastian Spain Donostia International Physics Center (DIPC) Paseo Manuel de Lardizabal 4 20018 Donostia-San Sebastian Spain;

    Centro de Fisica de Materiales CFM/MPC (CSIC-UPV/EHU) Paseo Manuel de Lardizabal 5 20018 Donostia-San Sebastian Spain Donostia International Physics Center (DIPC) Paseo Manuel de Lardizabal 4 20018 Donostia-San Sebastian Spain;

    Institut fuer Chemie Universitaet Potsdam Karl-Liebknecht-Strasse 24-25 D-14476 Potsdam Germany;

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