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Highly valley-polarized singlet and triplet interlayer excitons in van der Waals heterostructure

机译:van der Waals异质结构的高度谷极化单态和三联层间激子

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摘要

Two-dimensional semiconductors feature valleytronics phenomena due to locking of the spin and momentum valley of the electrons. However, the valley polarization is intrinsically limited in monolayer crystals by the fast intervalley electron-hole exchange. Heterobilayer crystals have been shown to have a longer exciton lifetime and valley depolarization time. Yet most reported valley polarization was low; the valley selection rules and mechanisms of valley depolarization remain controversial. Here, we show that nearly pure valley polarizations are achievable in high-quality heterostructures with precise momentum-valley alignment. Together with timeresolved and temperature dependence measurements, we furthermore identify both singlet and brightened triplet interlayer excitons with opposite valley polarizations, which originate from direct band-gap transitions and are localized at the H-h(h) atomic registry-corresponding to the band minima of the heterostructure. Our results also reveal ultrafast interlayer electron transfer and strongly suppressed interlayer exciton valley depolarization. Our results pave the way for using semiconductor heterobilayers to control valley selection rules for valleytronic applications.
机译:二维半导体具有谷谷特征,由于锁定电子的旋转和电动谷的旋转。然而,谷极化通过快速的inchalley电子 - 空穴交换在单层晶体中本质上限制。已经显示出杂体层晶体具有更长的激子寿命和谷去极化时间。然而,大多数报道的谷极化低;山谷选择规则和谷地相机的机制仍然存在争议。在这里,我们表明,在高质量的异质结构中可以实现几乎纯的谷偏振,精确的动量谷对齐。与TimerEnolved和温度依赖性测量一起,我们还识别单线件和亮度的三联层间混合器,其具有相反的谷偏振,源于直接带间隙转变,并且在HH(H)原子注册表中局部地对应于频段最小值异质结构。我们的结果还揭示超额外的层间电子转移和强烈抑制的层间激子谷去极化。我们的结果为使用半导体异化器来控制谷类应用的谷选择规则来铺平道路。

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  • 来源
    《Physical review》 |2019年第4期|041402.1-041402.6|共6页
  • 作者单位

    Univ Michigan Dept Phys 450 Church St Ann Arbor MI 48109 USA;

    Univ Michigan Appl Phys Program 450 Church St Ann Arbor MI 48109 USA;

    Univ Texas Austin Dept Elect & Comp Engn Microelect Res Ctr Austin TX 78758 USA;

    Univ Michigan Dept Phys 450 Church St Ann Arbor MI 48109 USA;

    Univ Michigan Dept Phys 450 Church St Ann Arbor MI 48109 USA;

    Univ Michigan Dept Phys 450 Church St Ann Arbor MI 48109 USA;

    Univ Texas Austin Dept Elect & Comp Engn Microelect Res Ctr Austin TX 78758 USA;

    Univ Texas Austin Dept Elect & Comp Engn Microelect Res Ctr Austin TX 78758 USA;

    Univ Michigan Dept Phys 450 Church St Ann Arbor MI 48109 USA|Univ Michigan Appl Phys Program 450 Church St Ann Arbor MI 48109 USA;

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