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Manipulation of saturation magnetization and perpendicular magnetic anisotropy in epitaxial Co_xMn_(4-x)N films with ferrimagnetic compensation

机译:具有亚铁磁补偿的外延Co_xMn_(4-x)N薄膜的饱和磁化强度和垂直磁各向异性的操纵

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摘要

Spintronics devices utilizing a magnetic domain-wall motion have attracted increasing attention, and ferri-magnetic materials with almost-compensated magnetic moments are highly required to realize the fast magnetic domain-wall motion. Here, we report a key function for this purpose in the antiperovskite Co_xMn_(4-x)N film. We have grown Co_xMn_(4-x)N films with various Co/Mn ratios on SrTiO_3(001) by molecular-beam epitaxy. High-quality growth is confirmed and a perpendicular magnetization emerges at x = 0, 0.2, 0.5, and 0.8, whereas it turns into in plane for x ≥ 1.1. The saturation magnetization M_s decreases as x increases and reaches a minimum value of 15 emu/cm~3 at x = 0.8. Then, it increases with x when 0.8 ≤ x ≤ 3.6 and saturates. These results indicate that M_s and magnetic anisotropy of Co_xMn_(4-x)N films can be manipulated by the Co composition. X-ray absorption spectroscopy and magnetic circular dichroism measurements revealed that Co atoms tend to occupy the I site in the antiperovskite lattice and reasonably explains the origin of minimum M_s near x = 0.8, where a compensation of magnetic moments occurs among different atomic sites. We consider that the nearly compensated ferrimagnetic Co_(0.8)Mn_(3.2)N is suitable for application to current-induced domain-wall motion devices.
机译:利用磁畴壁运动的自旋电子器件引起了越来越多的关注,并且为了实现快速的磁畴壁运动,极需要具有几乎补偿的磁矩的亚铁磁性材料。在这里,我们报告了抗钙钛矿Co_xMn_(4-x)N薄膜中为此目的的关键功能。我们已经通过分子束外延在SrTiO_3(001)上生长了具有不同Co / Mn比的Co_xMn_(4-x)N薄膜。确认了高质量的生长,并且在x = 0、0.2、0.5和0.8处出现了垂直磁化强度,而对于x≥1.1则变成了平面内。饱和磁化强度M_s随着x的增加而减小,并在x = 0.8时达到最小值15 emu / cm〜3。然后,当0.8≤x≤3.6时,它随x增大并饱和。这些结果表明,Co组成可以控制Co_xMn_(4-x)N薄膜的M_s和磁各向异性。 X射线吸收光谱法和磁性圆二色性测量表明,Co原子倾向于占据抗钙钛矿晶格中的I位,并合理地解释了x = 0.8附近的最小M_s的起源,其中磁矩的补偿发生在不同原子位之间。我们认为,几乎补偿的亚铁磁Co_(0.8)Mn_(3.2)N适用于电流感应畴壁运动装置。

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  • 来源
    《Physical review》 |2020年第10期|104401.1-104401.8|共8页
  • 作者单位

    Institute of Applied Physics University of Tsukuba Tsukuba Ibaraki 305-8573 Japan Institute for Materials Research Tohoku University Sendai 980-8577 Japan;

    Institute of Applied Physics University of Tsukuba Tsukuba Ibaraki 305-8573 Japan;

    Graduate School of Science Hiroshima University Higashi-Hiroshima Hiroshima 739-8526 Japan;

    The Institute of Scientific and Industrial Research Osaka University Ibaraki Osaka 567-0047 Japan;

    Department of Physics The University of Tokyo Bunkyo-ku Tokyo 113-0033 Japan;

    Materials Sciences Research Center Japan Atomic Energy Agency Sayo Hyogo 679-5148 Japan;

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