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Absence of strong localization at low conductivity in the topological surface state of low-disorder Sb_2Te_3

机译:低序Sb_2Te_3的拓扑表面状态下低电导率下没有强定位

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摘要

We present low-temperature transport measurements of a gate-tunable thin-film topological insulator system that features high mobility and low carrier density. Upon gate tuning to a regime around the charge neutrality point, we infer an absence of strong localization even at conductivities well below e(2)/h, where two-dimensional electron systems should conventionally scale to an insulating state. Oddly, in this regime the localization coherence peak lacks conventional temperature broadening, though its tails do change dramatically with temperature. Using a model with electron-impurity scattering, we extract values for the disorder potential and the hybridization of the top and bottom surface states.
机译:我们介绍了具有高迁移率和低载流子密度的栅极可调薄膜拓扑绝缘体系统的低温传输测量。在将栅极调谐到电荷中性点附近的状态时,即使在电导率远低于e(2)/ h的情况下(二维电子系统通常应按比例缩放为绝缘状态),我们也可以推断出没有强烈的局部化。奇怪的是,在这种情况下,定位相干峰没有常规的温度展宽,尽管其尾部确实会随温度而急剧变化。使用具有电子杂质散射的模型,我们提取无序电势以及顶部和底部表面状态的杂化值。

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  • 来源
    《Physical review》 |2019年第20期|201101.1-201101.6|共6页
  • 作者单位

    Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA|SLAC Natl Accelerator Lab, Stanford Inst Mat & Energy Sci, Menlo Pk, CA 94025 USA;

    Natl Univ Singapore, Dept Phys, Singapore 117551, Singapore|Natl Univ Singapore, Ctr Adv 2D Mat & Graphene Res Ctr, Singapore 117546, Singapore;

    Natl Univ Singapore, Dept Phys, Singapore 117551, Singapore|Natl Univ Singapore, Ctr Adv 2D Mat & Graphene Res Ctr, Singapore 117546, Singapore;

    Rutgers State Univ, Dept Mat Sci & Engn, Piscataway, NJ 08854 USA;

    SLAC Natl Accelerator Lab, Stanford Inst Mat & Energy Sci, Menlo Pk, CA 94025 USA|Stanford Univ, Dept Phys, Stanford, CA 94305 USA|MIT, Dept Phys, Cambridge, MA 02139 USA|Sci Philanthropy Alliance, 480 South Calif Ave, Palo Alto, CA 94306 USA;

    Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA;

    Natl Univ Singapore, Dept Phys, Singapore 117551, Singapore|Natl Univ Singapore, Ctr Adv 2D Mat & Graphene Res Ctr, Singapore 117546, Singapore|Yale NUS Coll, Singapore 138614, Singapore;

    SLAC Natl Accelerator Lab, Stanford Inst Mat & Energy Sci, Menlo Pk, CA 94025 USA|Stanford Univ, Dept Phys, Stanford, CA 94305 USA;

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