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首页> 外文期刊>Physical review. B, Condensed Matter And Materals Physics >Theoretical study of dislocation nucleation from simple surface defects in semiconductors
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Theoretical study of dislocation nucleation from simple surface defects in semiconductors

机译:半导体中简单表面缺陷的位错形核的理论研究

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摘要

Large-scale atomistic calculations, using empirical potentials for modeling semiconductors, have been performed on a stressed system with linear surface defects like steps. Although the elastic limits of systems with surface defects remain close to the theoretical strength, the results show that these defects weaken the atomic structure, initializing plastic deformations, in particular dislocations. The character of the dislocation nucleated can be predicted considering both the resolved shear stress related to the applied stress orientation and the Peierls stress. At low temperature, only glide events in the shuffle set planes are observed. Then they progressively disappear and are replaced by amorphization/melting zones at a temperature higher than 900 K.
机译:使用经验电势对半导体进行建模的大规模原子计算已在具有线性表面缺陷(如台阶)的应力系统上执行。尽管具有表面缺陷的系统的弹性极限仍接近理论强度,但结果表明,这些缺陷会削弱原子结构,从而初始化塑性变形,特别是位错。可以考虑与施加应力方向有关的解析剪切应力和佩尔应力来预测位错形核的特征。在低温下,仅观察到混洗设定平面中的滑行事件。然后它们逐渐消失,并在高于900 K的温度下被非晶化/熔化区取代。

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