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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >Absolute measurements of the triplet-triplet annihilation rate and the charge-carrier recombination layer thickness in working polymer light-emitting diodes based on polyspirobifluorene
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Absolute measurements of the triplet-triplet annihilation rate and the charge-carrier recombination layer thickness in working polymer light-emitting diodes based on polyspirobifluorene

机译:基于聚螺二芴的工作聚合物发光二极管中三重态-三重态an灭率和电荷-载流子复合层厚度​​的绝对测量

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The triplet exciton densities in electroluminescent devices prepared from two polyspirobifluorene derivatives have been investigated by means of time-resolved transient triplet absorption as a function of optical and electrical excitation power at 20 K. Because of the low mobility of the triplet excitons at this temperature, the triplet generation profile within the active polymer layer is preserved throughout the triplet lifetime and as a consequence the absolute triplet-triplet annihilation efficiency is not homogeneously distributed but depends on position within the active layer. This then gives a method to measure the charge-carrier recombination layer after electrical excitation relative to the light penetration depth, which is identical to the triplet generation layer after optical excitation. With the latter being obtained from ellipsometry, an absolute value of 5 nm is found for the exciton formation layer in polyspirobifluorene devices. This layer increases to 11 nm if the balance between the electron and the hole mobility is improved by chemically modifying the polymer backbone. Also, and consistent with previous work, triplet diffusion is dispersive at low temperature. As a consequence of this, the triplet-triplet annihilation rate is not a constant in the classical sense but depends on the triplet excitation dose. At 20 K and for typical excitation doses, absolute values of the latter rate are of the order of 10~(-14) cm~3 s~(-1).
机译:通过时间分辨的瞬态三重态吸收作为在20 K下的光和电激发功率的函数,已经研究了由两种聚螺二芴衍生物制备的电致发光器件中的三重态激子密度。由于在此温度下三重态激子的迁移率较低,在整个三重态寿命中,活性聚合物层内的三重态产生轮廓得以保留,因此,绝对的三重态-三重态an灭效率不是均匀分布的,而是取决于活性层中的位置。然后,这提供了一种在电激发之后相对于光穿透深度测量电荷-载流子复合层的方法,该方法与光激发之后的三重态产生层相同。通过椭圆偏振法获得后者,在聚螺双芴装置中发现激子形成层的绝对值为5 nm。如果电子和空穴迁移率之间的平衡通过化学修饰聚合物主链得以改善,则该层将增加至11 nm。而且,与先前的工作一致,三重态扩散在低温下是分散的。因此,三重态-三重态an灭率在经典意义上不是恒定的,而是取决于三重态激发剂量。在20 K和典型的激发剂量下,后者速率的绝对值约为10〜(-14)cm〜3 s〜(-1)。

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