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Subwavelength imaging at optical frequencies using a transmission device formed by a periodic layered metal-dielectric structure operating in the canalization regime

机译:使用传输设备,在光频率下进行亚波长成像,该传输设备由在渠化过程中运行的周期性分层金属介电结构形成

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摘要

Imaging with subwavelength resolution using a periodic metal-dielectric layered structure is demonstrated. The structure operates in canalization regime as a transmission device and it does not involve negative refraction and amplification of evanescent modes. The thickness of the structure has to be an integer number of half-wavelengths and can be made as large as required for ceratin applications, in contrast to the solid metallic slabs operating with subwavelength resolution which have to be much thinner than the wavelength. Resolution of λ/20 at 600 nm wavelength is confirmed by numerical simulation for a 300 nm thick structure formed by a periodic stack of 10 nm layers of glass with ε = 2 and 5 nm layers of metal-dielectric composite with ε = -1. Resolution of λ/60 is predicted for a structure with same thickness, period and operating frequency, but formed by 7.76 nm layers of silicon with ε = 15 and 7.24 nm layers of silver with ε = -14.
机译:演示了使用周期性金属介电层状结构以亚波长分辨率成像。该结构在渠化系统中作为传输设备运行,它不涉及负折射和渐逝模式的放大。该结构的厚度必须是半波长的整数,并且可以做成与陶瓷应用所需的一样大,这与以亚波长分辨率操作的固态金属平板相比要薄得多,而亚波长分辨率的平板必须比波长薄得多。通过对300 nm厚的结构进行数值模拟,可以确定λ/ 20在600 nm波长处的分辨率,该结构由10 nm的ε= 2的玻璃层和5 nm的ε= -1的金属电介质复合物的周期性堆叠形成。对于具有相同厚度,周期和工作频率但由ε= 15的7.76 nm硅层和ε= -14的7.24 nm的银层形成的结构,可预测λ/ 60的分辨率。

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