Superimposed measuring structure used in the production of integrated circuits comprises a first periodic structure formed in a first component layer and a second periodic structure formed in a second component arranged over the first layer

摘要

Superimposed measuring structure comprises a first periodic structure formed in a first component layer and a specified measuring position and a second periodic structure formed in a second component arranged over the first component layer. The first periodic structure has a first periodic partial structure and a second periodic partial structure each having structural elements. A few of the structural elements have a segmented region and the periodic structures form a periodic stacked structure at a specified measuring position. An independent claim is also included for a method for the production of a the measuring structure.