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首页> 外文期刊>Physical review. B, Condensed Matter And Materials Physics >Ferromagnetism induced by planar nanoscale CuO inclusions in Cu-doped ZnO thin films
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Ferromagnetism induced by planar nanoscale CuO inclusions in Cu-doped ZnO thin films

机译:掺杂Cu的ZnO薄膜中的平面纳米CuO夹杂物诱导的铁磁性

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摘要

We report ferromagnetism above 300 K in ZnO:xCu (x in at. %) sputtered thin films. For x < 1, a large magnetic moment of 1.6 μ_B/Cu was observed, which decreases monotonically with increasing x. We find evidence that the ferromagnetic moment is due to Cu-O planar nanophase inclusions in ZnO basal planes. The presence of CuO nanophase is confirmed by transmission electron microscopy, x-ray diffraction, and Raman spectroscopy studies. These inclusions are present even for x < 3, where Cu-O structures of a few nanometers in size are observed. Field-cooled and zero-field-cooled magnetization measurements show a bifurcation for temperatures below 300 K.
机译:我们报道了在ZnO:xCu(x in at。%)溅射薄膜中300 K以上的铁磁性。对于x <1,观察到1.6μB/ Cu的大磁矩,随着x的增加单调减小。我们发现有证据表明铁磁矩是由于ZnO基面中的Cu-O平面纳米相夹杂物引起的。透射电子显微镜,X射线衍射和拉曼光谱研究证实了CuO纳米相的存在。即使对于x <3,也存在这些夹杂物,其中观察到了几纳米大小的Cu-O结构。场冷和零场磁化测量显示温度低于300 K时出现分叉。

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