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Modeling of quantum point contacts in high magnetic fields and with current bias outside the linear response regime

机译:在高磁场中以及线性响应范围外具有电流偏置的量子点接触的建模

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摘要

The electron and current-density distributions in the close proximity of quantum point contacts (QPCs) are investigated. A three-dimensional Poisson equation is solved self-consistently to obtain the electron density and potential profile in the absence of an external magnetic field for gate and etching defined devices. We observe the surface charges and their apparent effect on the confinement potential, when considering the (deeply) etched QPCs. In the presence of an external magnetic field, we investigate the formation of the incompressible strips and their influence on the current distribution both in the linear response and out of linear response regime. A spatial asymmetry of the current carrying incompressible strips, induced by the large source drain voltages, is reported for such devices in the nonlinear regime.
机译:研究了量子点接触(QPC)附近的电子和电流密度分布。在没有外部磁场的情况下,可以自洽求解三维Poisson方程,以得到电子密度和电势分布,以用于栅极和蚀刻定义的器件。当考虑(深度)蚀刻的QPC时,我们观察到表面电荷及其对限制电位的明显影响。在存在外部磁场的情况下,我们研究了不可压缩带的形成及其对线性响应和线性响应之外的电流分布的影响。对于这种处于非线性状态的器件,据报道由大的源极漏极电压引起的载流不可压缩条带的空间不对称性。

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