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首页> 外文期刊>Physical review >Spin-dependent tunneling in epitaxial Fe/Cr/MgO/Fe magnetic tunnel junctions with an ultrathin Cr(001) spacer layer
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Spin-dependent tunneling in epitaxial Fe/Cr/MgO/Fe magnetic tunnel junctions with an ultrathin Cr(001) spacer layer

机译:具有超薄Cr(001)间隔层的外延Fe / Cr / MgO / Fe磁性隧道结中的自旋依赖性隧穿

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摘要

We fabricated fully epitaxial Fe/Cr/MgO/Fe(001) magnetic tunnel junctions (MTJs) with an atomically flat ultrathin Cr(001) layer grown below the MgO banner layer and studied the spin-dependent transport to clarify scattering process of tunneling electrons. Because Cr does not have Bloch states with Δ_1 symmetry at the Fermi energy (E_F), Δ_1 evanescent states in MgO, which dominantly mediate the tunneling current, cannot couple with Cr Bloch states without a scattering process. The Fe/Cr/MgO/Fe(001) MTJs are therefore a model system for studying nonspecular scattering processes where the orbital symmetry of tunneling states is not conserved. The resistance-area (RA) product of the MTJs was found to not increase exponentially as a function of the Cr thickness (t_(Cr)), indicating that the Cr layer does not act as a perfect tunnel barrier despite of the absence of Δ_1 states at E_F. Moreover, the magnetoresi stance ratio of the MTJs was seen to oscillate as a function of t_(Cr) with a period of 2 monolayers, reflecting the layered antiferromagnetic structure of Cr(001). Surprisingly, the MR ratio showed local maxima at the odd numbers of Cr monolayers and local minima at the even numbers of Cr monolayers, indicating that the tunneling current is oppositely spin polarized with respect to the interface magnetization. These results suggest that nonspecular scatterings mediate the coupling between evanescent states in MgO and certain non-Δ_1 Bloch states in Cr that have negative spin polarization, thereby inducing nonspecular tunneling current even at a low temperature and a small bias voltage. We also investigated, as a reference sample, Fe/MgO/Cr/Fe MTJs with a less-oxidized Cr/MgO interface by growing the Cr(001) layer on the MgO barrier layer and found that their RA product increased much more rapidly with increasing t_(Cr). This indicates that partial oxidation of interface Cr atoms in the Fe/Cr/MgO/Fe MTJs is one of the major origins of nonspecular scatterings. Both an increase in temperature and the application of bias voltage were found to greatly enhance the electron scattering that gives rise to tunneling conductance. While the temperature dependence of the antiparallel conductance due to magnon scatterings follows the Bloch T_(3/2) law, the conductance due to nonspecular scatterings deviates from the Bloch T_(3/2) law. The present experimental results give us important clues to a clearer understanding of the tunneling process in MgO-based MTJs.
机译:我们制造了完全外延的Fe / Cr / MgO / Fe(001)磁性隧道结(MTJs),并在MgO横幅层下方生长了原子平坦的超薄Cr(001)层,并研究了自旋依赖性输运,以阐明隧道电子的散射过程。由于Cr在费米能量(E_F)处不具有Δ_1对称的Bloch状态,因此MgO中的Δ_1e逝态主要介导隧穿电流,如果没有散射过程,则无法与Cr Bloch态耦合。因此,Fe / Cr / MgO / Fe(001)MTJ是用于研究非镜面散射过程的模型系统,在该过程中,不守恒于隧穿态的轨道对称性。发现MTJ的电阻面积(RA)乘积不会随Cr厚度(t_(Cr))的增加而指数增加,这表明尽管没有Δ_1,Cr层也不能充当理想的隧道势垒E_F的状态。此外,MTJ的磁阻比率随t_(Cr)的变化而振荡,周期为2个单层,反映了Cr(001)的分层反铁磁结构。出人意料的是,MR比在Cr单层的奇数处显示局部最大值,在Cr单层的偶数处显示局部最小值,这表明隧道电流相对于界面磁化是相反的自旋极化。这些结果表明,非镜面反射散射介导了MgO的e逝态与Cr中具有负自旋极化的某些非Δ_1Bloch态之间的耦合,从而即使在低温和小的偏置电压下也感应出非镜面隧穿电流。我们还通过在MgO势垒层上生长Cr(001)层来研究具有较低氧化Cr / MgO界面的Fe / MgO / Cr / Fe MTJ作为参考样品,发现它们的RA产物随增加t_(Cr)。这表明Fe / Cr / MgO / Fe MTJs中界面Cr原子的部分氧化是非镜面散射的主要来源之一。发现温度的升高和偏压的施加都极大地增强了电子散射,从而引起了隧道电导。尽管由于磁振子散射引起的反平行电导的温度依赖性遵循Bloch T_(3/2)定律,但由于非镜面散射引起的电导率却偏离Bloch T_(3/2)定律。目前的实验结果为我们提供了重要的线索,可以使人们更清楚地了解基于MgO的MTJ的隧穿过程。

著录项

  • 来源
    《Physical review》 |2009年第17期|174436.1-174436.8|共8页
  • 作者单位

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan Japan Society for the Promotion of Science, Sumitomo-Ichibancho FS Bldg., 8 Ichibancho, Chiyoda-ku, Tokyo 102-8472, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

    Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute, Tsukuba, Ibaraki 305-8568, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    tunneling; metal-insulator-metal structures; magnetic memory using magnetic tunnel junctions;

    机译:隧道金属-绝缘体-金属结构;使用磁隧道结的磁存储器;

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