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Stability and electronic structure of potassium-intercalated hexagonal boron nitride from density functional calculations

机译:从密度泛函计算看钾嵌入六方氮化硼的稳定性和电子结构

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摘要

By using the local-density approximation in density functional theory, we explore the possibility of a metallic layered compound derived from hexagonal boron nitride (h-BN). We find that the intercalation process of potassium atoms into the interlayer spacing of h-BN is exothermic with a formation energy of approximately 1.6 eV per potassium atom, and that the electronic structure of potassium-intercalated h-BN under equilibrium interlayer distance is metallic, in which electrons are injected into unoccupied, nearly-free-electron states. The calculated Fermi surfaces of the compound exhibit characteristics similar to that of graphite intercalation compounds doped with alkali/alkali-earth metals.
机译:通过使用密度泛函理论中的局部密度近似,我们探索了由六方氮化硼(h-BN)衍生出金属层状化合物的可能性。我们发现,钾原子在h-BN的层间间距中的嵌入过程是放热的,每个钾原子的形成能约为1.6 eV,并且在平衡层间距离下钾嵌入的h-BN的电子结构是金属的,其中电子被注入到未占据的,几乎自由的电子状态。所计算出的化合物的费米表面具有与掺杂有碱/碱土金属的石墨插层化合物相似的特性。

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