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Hydrogen-induced interactions in vanadium from first-principles calculations

机译:氢在钒中的相互作用从第一性原理计算

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We present a first-principles study on hydrogen-induced interactions in vanadium, such as V-H, H-H, and vacancy-H interactions, which are relevant to the H-induced embrittlement in vanadium alloys employed as H_2 purification membranes. Insertion of H at tetrahedral interstitial sites of V proceeds exothermically and lowers the energy levels of V 3d, 4s, and Ap states that form a bonding state with H Is. However, H insertion accompanies large local atomic relaxation, thereby developing stress inside the material, which makes a good contrast with Pd where H can be added without significant structural distortion. The strength of the H-H interaction in V, which is indeed an interaction between two V-H bonding states, is negligibly small compared with that of the V-H interaction itself when the H-H distance is larger than ~2 A. We show that six H atoms can be trapped at the six octahedral sites next to a vacancy in V. Formation of H2 molecules is energetically unfavorable, which is different from the cases of Al and W, where H_2 molecules can be formed when enough H atoms are accumulated in a vacancy. Reasons behind this difference, together with the energetics of H-induced superabundant vacancy formation, are discussed.
机译:我们目前对氢在钒中诱导的相互作用(例如V-H,H-H和空位-H相互作用)进行第一性原理研究,这与用作H_2净化膜的钒合金中H诱导的脆化有关。 H在V的四面体间隙位置插入时放热进行,并降低了与H Is形成键合状态的V 3d,4s和Ap状态的能级。但是,H的插入会伴随较大的局部原子弛豫,从而在材料内部产生应力,这与Pd形成了良好的对比,在Pd中可以添加H而不会出现明显的结构变形。当HH距离大于〜2 A时,V中HH相互作用的强度(实际上是两个VH键合状态之间的相互作用)与VH相互作用本身的强度相比可以忽略不计。我们证明了六个H原子可以捕获在V中一个空位旁的六个八面体位置。H2分子的形成在能量上不利,这与Al和W的情况不同,在Al和W中,当空位中积累足够的H原子时可以形成H_2分子。讨论了这种差异背后的原因,以及氢诱导的超大量空位形成的能量学。

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