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首页> 外文期刊>Physical review >Suppression of nonradiative recombination in ionic insulators by defects: Role of fast electron trapping in Tl-doped CsI
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Suppression of nonradiative recombination in ionic insulators by defects: Role of fast electron trapping in Tl-doped CsI

机译:通过缺陷抑制离子绝缘子中的非辐射重组:快速电子俘获在掺Tl的CsI中的作用

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In semiconductors, defects often assist nonradiative relaxation. However, Tl doping can significantly suppress the nonradiative relaxation in alkali halides to increase scintillation efficiency. Without the Tl, it is known that the creation of Frenkel pairs at self-trapped excitons, assisted by excited electron and hole relaxations, is the reason for the nonradiative relaxation. Here we show by first-principles calculation that Tl doping introduces Tl p states inside the band gap to trap the excited electrons. The trapping is highly effective to within several picoseconds, as revealed by time-dependent density functional theory calculations. It alters the nonradiative relaxation process to result in a noticeable increase in the relaxation barrier from 0.3 to 0.63 eV, which reduces the nonradiative relaxation by roughly a factor of 10~5 at room temperature.
机译:在半导体中,缺陷通常有助于非辐射弛豫。然而,T1掺杂可以显着抑制碱金属卤化物中的非辐射弛豫,以增加闪烁效率。没有T1,众所周知的是,在自陷陷子中,在激发电子和空穴弛豫的辅助下,Frenkel对的产生是非辐射弛豫的原因。在这里,我们通过第一性原理计算表明,Tl掺杂在带隙内引入了Tl p状态以捕获激发的电子。如随时间变化的密度泛函理论计算所揭示的那样,捕集在几皮秒内非常有效。它改变了非辐射弛豫过程,导致弛豫势垒从0.3 eV显着增加到0.63 eV,这在室温下将非辐射弛豫降低了大约10〜5倍。

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