...
机译:表面终止在实现TlBiSe_2和TlBiTe_2的体带隙内良好隔离的拓扑表面状态中的作用
Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016, India,Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, 117546 Singapore,Department of Physics, National University of Singapore, 117542 Singapore;
Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, 117546 Singapore,Department of Physics, National University of Singapore, 117542 Singapore;
Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016, India;
Department of Physics, Northeastern University, Boston, Massachusetts 02115, USA;
机译:表面终止在实现TlBiSe2和TlBiTe2的体带隙内良好隔离的拓扑表面状态中的作用
机译:影响拓扑绝缘子Bi_2Te _3和Bi_2Se_3的带隙边缘分布和表面状态的因素的理论研究
机译:拓扑绝缘子Bi_2Se_3的电压调谐晶体中的体隙和表面态电导
机译:两维声晶体中表面和散装声波的可调谐声子带隙
机译:拓扑绝缘子和拓扑超导体的外来表面状态-3d拓扑绝缘子表面中的准粒子散射和马约拉那费米子的实现。
机译:LaSb和LaBi中的体带反演和表面狄拉克锥:一种新的拓扑异质结构的预测
机译:表面终止在实现良好隔离拓扑中的作用 TlBise $ _2 $和TlBiTe $ _2 $中的体带隙内的表面状态