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Wide Operational Windows of Edge-Localized Mode Suppression by Resonant Magnetic Perturbations in the DIII-D Tokamak

机译:通过DIII-D Tokamak中的谐振磁扰动宽的边缘定位模式抑制的宽操作窗口

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摘要

Edge-localized mode (ELM) suppression by resonant magnetic perturbations (RMPs) generally occurs over very narrow ranges of the plasma current (or magnetic safety factor q(95)) in the DIII-D tokamak. However, wide q(95) ranges of ELM suppression are needed for the safety and operational flexibility of ITER and future reactors. In DIII-D ITER similar shape plasmas with n = 3 RMPs, the range of q(95) for ELM suppression is found to increase with decreasing electron density. Nonlinear two-fluid MHD simulations reproduce the observed q(95) windows of ELM suppression and the dependence on plasma density, based on the conditions for resonant field penetration at the top of the pedestal. When the RMP amplitude is close to the threshold for resonant field penetration, only narrow isolated magnetic islands form near the top of the pedestal, leading to narrow q(95) windows of ELM suppression. However, as the threshold for field penetration decreases with decreasing density, resonant field penetration can take place over a wider range of q(95). For sufficiently low density (penetration threshold) multiple magnetic islands form near the top of the pedestal giving rise to continuous q(95) windows of ELM suppression. The model predicts that wide q(95) windows of ELM suppression can be achieved at substantially higher pedestal pressure in DIII-D by shifting to higher toroidal mode number (n = 4) RMPs.
机译:边缘局部化模式(ELM)通过谐振磁扰动(RMP)抑制通常在DIII-D Tokamak中的等离子体电流(或磁安全因子Q(95))上的非常窄的范围内发生。然而,艾尔和未来反应堆的安全性和操作灵活性需要宽Q(95)榆树抑制范围。在DIII-D Iter类似的形状等离子体中具有n = 3 rmps,发现ELM抑制的Q(95)的范围随着电子密度的降低而增加。非线性两种流体MHD模拟再现ELM抑制的观察到的Q(95)窗口和对等离子体密度的依赖性,基于基座顶部的谐振场渗透的条件。当RMP幅度接近谐振场穿透的阈值时,仅在基座顶部附近的窄隔离磁岛形式,导致ELM抑制的窄Q(95)窗口。然而,随着场渗透的阈值随着密度降低而降低,随着密度的降低,可以在更广泛的Q(95)范围内进行谐振场穿透。对于足够低的密度(渗透阈值),在基座顶部附近的多个磁岛形成,从而产生ELM抑制的连续Q(95)窗口。该模型预测ELM抑制的宽Q(95)窗口可以通过转移到更高的环形模式数(n = 4)RMPS在DIII-D中的基本上更高的基座压力下实现。

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  • 来源
    《Physical review letters》 |2020年第4期|045001.1-045001.6|共6页
  • 作者单位

    Princeton Plasma Phys Lab POB 451 Princeton NJ 08543 USA;

    Princeton Plasma Phys Lab POB 451 Princeton NJ 08543 USA;

    Princeton Plasma Phys Lab POB 451 Princeton NJ 08543 USA;

    Princeton Plasma Phys Lab POB 451 Princeton NJ 08543 USA;

    Univ Calif San Diego 9500 Gilman Dr La Jolla CA 92093 USA;

    Gen Atom Co POB 85608 San Diego CA 92186 USA;

    Max Planck Inst Plasma Phys D-85748 Garching Germany;

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