Atomic Dipole Moment Distribution of Si Atoms on a Si(111)-(7 × 7) Surface Studied Using Noncontact Scanning Nonlinear Dielectric Microscopy

摘要

A local atomic electric dipole moment distribution of Si atoms on Si(111)-(7 × 7) surface is clearly resolved by using a new technique called noncontact scanning nonlinear dielectric microscopy. The dc-bias voltage dependence of the atomic dipole moment on the Si(111)-(7 × 7) surface is measured. At the weak applied voltage of —0.5 V, a positive dipole moment is detected on the Si adatom sites, whereas a negative dipole moment is observed at the interstitial sites of inter Si adatoms. Moreover, the quantitative dependence of the surface dipole moment as a function of the applied dc voltage is also revealed at a fixed point above the sample surface. This is the first successful demonstration of direct atomic dipole moment observation achieved in the field of capacitance measurement.