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Direct comparison of photoluminescence lifetime and defect densities in ZnO epilayers studied by time-resolved photoluminescence and slow positron annihilation techniques

机译:通过时间分辨光致发光和慢正电子an灭技术研究的ZnO外延层中光致发光寿命和缺陷密度的直接比较

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摘要

The roles of point defects and defect complexes governing nonradiative processes in ZnO epilayers were studied using time-resolved photoluminescence (PL) and slow positron annihilation measurements. The density or size of Zn vacancies (V_(Zn)) decreased and the nonradiative PL lifetime (τ_(nr)) increased with higher growth temperature for epilayers grown on a ScAlMgO_4 substrate. Accordingly, the steady-state free exci-tonic PL intensity increased with increase in τ_(nr) at room temperature. The use of a homoepitaxial substrate further decreased the V_(Zn) concentration. However, no perfect relation between τ_(nr) and the density or size of V_(Zn) or other positron scattering centers was found. The results indicated that nonradiative recombination processes are governed not solely by single point defects, but by certain defect species introduced by the presence of V_(Zn) such as vacancy complexes.
机译:使用时间分辨光致发光(PL)和慢正电子an灭测量研究了点缺陷和缺陷配合物控制ZnO外延层中非辐射过程的作用。随着在ScAlMgO_4衬底上生长的外延层的生长温度升高,Zn空位(V_(Zn))的密度或大小减小,并且非辐射PL寿命(τ_(nr))增大。因此,在室温下,稳态自由激态PL强度随τ_(nr)的增加而增加。同质外延衬底的使用进一步降低了V_(Zn)浓度。但是,在τ_(nr)与V_(Zn)或其他正电子散射中心的密度或大小之间没有发现完美的关系。结果表明,非辐射重组过程不仅受单点缺陷控制,而且受空位络合物等V_(Zn)引入的某些缺陷种类的控制。

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